Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors

被引:104
|
作者
Georgieva, V [1 ]
Bogaerts, A [1 ]
Gijbels, R [1 ]
机构
[1] Univ Antwerp, Dept Chem, UIA, B-2610 Antwerp, Belgium
关键词
D O I
10.1063/1.1603348
中图分类号
O59 [应用物理学];
学科分类号
摘要
A one-dimensional particle-in-cell/Monte Carlo model is developed to study capacitively coupled (cc) radio-frequency discharges in a gas mixture of Ar, CF4, and N-2. The charged species, which are followed in the model, are: Electrons and Ar+, CF3+, N-2(+) F-, and CF3- ions. The simulation considers electron - neutral (Ar, CF4, and, N-2) collisions, various kinds of collisions of ions with neutrals, positive-negative ion recombination, and electron-ion recombination. The model yields results for electron and ion densities, fluxes and energy distributions, collision rates and electric field, and potential distributions. The simulations are performed for a 0.8/0. 1/0.1 ratio of Ar/CF4/N-2 mixture at a pressure of 30 mTorr in single (13.56 MHz) and dual frequency (2+27 MHz) cc reactors and a comparison between the two frequency regimes is made. Results show that the structure of the discharges is electronegative in both cases. F-1 and CF3- ions are the main negative charge carriers in the single and dual frequency regime, respectively. In the presence of low-frequency (2 MHz) and a strong electric field, the light F- ions are no longer confined in the bulk plasma and they partially respond to the instantaneous electric field. The calculated electron energy probability function profiles can be approximated to a Druyvesteyn and bi-Maxwellian distribution with high-energy tails in the single- and dual-frequency regime, respectively. The ion energy distribution is narrow with one outstanding peak in the single-frequency scheme, whereas it is wide and bimodal in the dual-frequency scheme. (C) 2003 American Institute of Physics.
引用
收藏
页码:3748 / 3756
页数:9
相关论文
共 50 条
  • [31] Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma
    Liu, Wen-Yao
    Du, Yong-Quan
    Liu, Yong-Xin
    Liu, Jia
    Zhao, Tian-Liang
    Xu, Yong
    Li, Xiao-Song
    Zhu, Ai-Min
    Wang, You-Nian
    PHYSICS OF PLASMAS, 2013, 20 (11)
  • [32] Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4 discharges
    Schulze, J.
    Derzsi, A.
    Donko, Z.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (04):
  • [33] Abnormal Enhancement of N2+ Emission Induced by Lower Frequency in N2 Dual-Frequency Capacitively Coupled Plasmas
    Yu Yiqing
    Xin Yu
    Lu Wenqi
    Ning Zhaoyuan
    PLASMA SCIENCE & TECHNOLOGY, 2012, 14 (03) : 222 - 226
  • [34] Electron power absorption mode transition in capacitively coupled Ar/CF4 discharges: hybrid modeling investigation
    Wen, Ying-Ying
    Li, Xin-Yang
    Zhang, Yu-Ru
    Song, Yuan-Hong
    Wang, You-Nian
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2022, 55 (20)
  • [35] Striations in dual-low-frequency (2/10 MHz) driven capacitively coupled CF4 plasmas
    Wang, Xiao-Kun
    Wang, Xiang-Yu
    Liu, Yong-Xin
    Schulze, Julian
    Donko, Zoltan
    Wang, You-Nian
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (06):
  • [36] 2-D FLUID SIMULATION OF DUAL-FREQUENCY CAPACITIVELY COUPLED PLASMA
    Lu Yi-jia
    Yan Da-qiang
    Chen Yao-song
    JOURNAL OF HYDRODYNAMICS, 2009, 21 (06) : 814 - 819
  • [37] Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
    Georgieva, V
    Bogaerts, A
    Gijbels, R
    PHYSICAL REVIEW E, 2004, 69 (02): : 026406 - 1
  • [38] 2-D FLUID SIMULATION OF DUAL-FREQUENCY CAPACITIVELY COUPLED PLASMA
    LU Yi-jia
    Journal of Hydrodynamics, 2009, 21 (06) : 814 - 819
  • [39] Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas
    Yamaguchi, Tsuyoshi
    Kimura, Tetsuya
    Koshimizu, Chishio
    Takeda, Keigo
    Kondo, Hiroki
    Ishikawa, Kenji
    Sekine, Makoto
    Hori, Masaru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (05)
  • [40] 2-D Fluid Simulation of Dual-Frequency Capacitively Coupled Plasma
    Yi-jia Lu
    Da-qiang Yan
    Yao-song Chen
    Journal of Hydrodynamics, 2009, 21 : 814 - 819