Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4 discharges

被引:68
|
作者
Schulze, J. [1 ,2 ]
Derzsi, A. [1 ]
Donko, Z. [1 ]
机构
[1] Hungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1121 Budapest, Hungary
[2] Ruhr Univ Bochum, Inst Plasma & Atom Phys, D-44780 Bochum, Germany
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2011年 / 20卷 / 04期
基金
匈牙利科学研究基金会;
关键词
CONSISTENT PARTICLE SIMULATION; SCATTERING CROSS-SECTIONS; ION ENERGY-DISTRIBUTION; RF PLASMAS; TRANSPORT-COEFFICIENTS; FUNCTIONAL SEPARATION; MONTE-CARLO; PARAMETERS; RESONANCE; DENSITIES;
D O I
10.1088/0963-0252/20/4/045008
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The electron heating and the electrical asymmetry effect (EAE) in electronegative dual-frequency capacitive CF4 discharges are investigated by particle-in-cell simulations and analytical modeling. One electrode is driven at 13.56 and 27.12 MHz with fixed but adjustable phase shift, theta, between the driving harmonics. First, the electron heating and ionization rates are studied, space and time resolved, for different phase shifts and pressures. The results are compared with those obtained for an electropositive gas (argon). In contrast to classical alpha- or gamma-mode operation, we observe the electron heating and ionization rates to be high inside the bulk. This bulk heating mode is a consequence of the high electronegativity of CF4 discharges, where the conductivity in the bulk is low due to the low density of electrons. Thus, a high electric field builds up to drive the RF current through the bulk causing a high electron mean energy and ionization rate in the discharge center. Second, we investigate the consequences of the bulk heating on the EAE. We focus on the electrical generation of a dc self-bias as a function of theta and the quality of the separate control of the ion mean energy and flux at the electrodes by tuning theta. Compared with argon discharges the high voltage drop across the plasma bulk and the specific ionization dynamics affect the bias generation and the separate control of ion properties. These effects are described and explained by an analytical model.
引用
收藏
页数:14
相关论文
共 50 条
  • [1] Electron heating modes and frequency coupling effects in dual-frequency capacitive CF4 plasmas
    Derzsi, Aranka
    Schuengel, Edmund
    Donko, Zoltan
    Schulze, Julian
    OPEN CHEMISTRY, 2015, 13 (01): : 346 - 361
  • [2] Electron heating mechanisms in dual-frequency capacitive discharges
    Turner, M. M.
    Chabert, P.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2007, 16 (02): : 364 - 371
  • [3] Effect of Electron Heating Mode on Charge-Up Damage in Dual-Frequency Capacitive Discharges
    Kwon, Hyoung Cheol
    Lee, Sung Hee
    Rehman, Aman-Ur
    Lee, Jae Koo
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 2530 - 2531
  • [4] Frequency dependence of the electrical asymmetry effect in dual-frequency capacitively coupled discharges
    Lafleur, T.
    Booth, J. P.
    APPLIED PHYSICS LETTERS, 2013, 102 (15)
  • [5] Temporal structure of electron heating in asymmetric single-frequency and dual-frequency capacitive discharges
    Ziegler, D.
    Mussenbrock, T.
    Brinkmann, R. P.
    PHYSICS OF PLASMAS, 2009, 16 (02)
  • [6] Collisionless heating in capacitive discharges enhanced by dual-frequency excitation
    Turner, MM
    Chabert, P
    PHYSICAL REVIEW LETTERS, 2006, 96 (20)
  • [7] Modelling of dual-frequency capacitive discharges
    Turner, M. M.
    Chabert, P.
    COMPUTER PHYSICS COMMUNICATIONS, 2007, 177 (1-2) : 88 - 92
  • [8] Dual-frequency capacitive discharges: Effect of low-frequency current on electron distribution function
    Kim, HC
    Lee, JK
    PHYSICS OF PLASMAS, 2005, 12 (05) : 1 - 10
  • [9] Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar discharges
    Dong Wan
    Xu Hai-Wen
    Dai Zhong-Ling
    Song Yuan-Hong
    Wang You-Nian
    ACTA PHYSICA SINICA, 2021, 70 (09)
  • [10] Experimental investigations of electron density and ion energy distributions in dual-frequency capacitively coupled plasmas for Ar/CF4 and Ar/O2/CF4 discharges
    Liu, Jia
    Liu, Yong-Xin
    Bi, Zhen-Hua
    Gao, Fei
    Wang, You-Nian
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (01)