A high performance of dual-gate TFTs with triple floating N+ channel

被引:0
|
作者
Park, Hyung-Seok [1 ]
Lee, Dae Yeon [1 ]
Jung, Min-Chul [1 ]
Hong, Seung-Woo [1 ]
Sung, Man Young [1 ]
Kang, Ey Goo
Rhie, Dong-Hee
机构
[1] Korea Univ, Dept Elect Engn, Seoul 136701, South Korea
关键词
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have simulated a dual-gate TFT which has triple floating n+ channel to improve the on-current of the dual-gate TFT. We achieved a low hole concentration at the source and channel junction causes the improvement the potential barrier so that we observed the reduction of the kink-effect. In this paper, we observed the reduction of the kink-effect compared with the conventional single-gate TFT and the improvement of the on-current compared with the conventional dual-gate TFT.
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页码:448 / 451
页数:4
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