Light absorption enhancement in metal-semiconductor-metal photodetectors using plasmonic nanostructure gratings

被引:2
|
作者
Das, Narottam [1 ]
Tan, Chee Leong [2 ]
Lysak, Volodymyr V. [3 ]
Alameh, Kamal [1 ,4 ]
Lee, Yong Tak [2 ,3 ,4 ]
机构
[1] Edith Cowan Univ, Electron Sci Res Inst, 270 Joondalup Dr, Joondalup, WA 6027, Australia
[2] Gwangju Inst Sci & Technol GIST, Sch Photon Sci, Gwangju 500712, South Korea
[3] GIST, Dept Informat & Commun, Gwangju, South Korea
[4] GIST, Dept Nanobio Mat & Elect, Gwangju, South Korea
关键词
Subwavelength gratings; surface plasmon polaritons; plasmonic nanostructures; FDTD simulation; nanophotonics; MSM-PDs; SUBWAVELENGTH HOLE ARRAYS; OPTICAL-TRANSMISSION; FILMS;
D O I
10.1109/HONET.2009.5423095
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we adopt the finite difference time-domain (FDTD) method to optimize the absorption of a novel metal-semiconductor-metal photodetector (MSM-PD) structure based on the use of a double-layer nanostructured metal grating. The metal fingers of the MSM-PDs are etched with appropriate depths to maximize light absorption through plasmonic effects. Simulation results show 40 times enhancement in 980nm light trapping due to extraordinary optical signal propagation through the nanostructured double-metal grating, in comparison to conventional MSM-PDs.
引用
收藏
页码:86 / +
页数:2
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