GaN HEMT Compact Model for Circuit Simulation

被引:0
|
作者
Syamal, Binit [1 ]
Ben Chiah, Siau [1 ]
Zhou, Xing [1 ]
Ajaykumar, Arjun [1 ]
Anand, M. J. [1 ]
Ng, Geok Ing [1 ]
Arulkumaran, S. [2 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore, Singapore
[2] Nanyang Technol Univ, Temasek Labs NTU, Singapore, Singapore
关键词
Buffer doping; compact modeling; GaN HEMTs; surface potential; Xsim;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A surface potential based scalable compact model for GaN high electron-mobility transistors (HEMTs) is presented in this work. Based on the unified regional surface potential approach (URSP) which considers subthreshold, moderate- and strong-inversion regions, we have modeled the variation of Fermi level (E-f) with respect to gate voltage (V-g). GaN buffer doping has been considered for obtaining the subthreshold regional solution using classical charge-voltage equation. The moderate- and strong-inversion models are derived from the coupled Poisson-Schrodinger solutions. Model scalability is presented by incorporating short channel effects (SCEs) and is validated with TCAD as well as measurement data with good match.
引用
收藏
页码:535 / 538
页数:4
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