Atomic force microscopic studies on the growth of self-assembled monolayers on SrTiO3-surfaces

被引：12
|
作者：
Kropman, BL [1 ]
Blank, DHA [1 ]
Rogalla, H [1 ]
机构：
[1] Univ Twente, Dept Appl Phys, NL-7500 AE Enschede, Netherlands
来源：
THIN SOLID FILMS | 1998年 / 327卷
关键词：
atomic force microscopy; octadecylchlorosilane; self-assembly;
D O I：
10.1016/S0040-6090(98)00625-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large 'fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：185 / 190
页数：6
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