Effective Reduction of Leakage Currents in Single-walled Carbon-nanotube-network Thin-film Transistors
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Jeong, Minho
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Jeong, Minho
Choi, Eunsuk
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Choi, Eunsuk
Lee, Kunhak
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lee, Kunhak
Kim, Jinoh
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Jinoh
Kim, Ahsung
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Ahsung
Chun, Sungwoo
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Chun, Sungwoo
Lim, Chaehyun
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lim, Chaehyun
Lee, Seung-Beck
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Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Hanyang Univ, Inst Nanosci & Technol, Seoul 133791, South KoreaHanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lee, Seung-Beck
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机构:
[1] Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
[2] Hanyang Univ, Inst Nanosci & Technol, Seoul 133791, South Korea
We report on the dependence of the reduced metallic percolation paths of single-wall carbon-nanotube-network thin-films (SCNTFs) on the channel aspect ratio and the number of strips (N(strip)). A longer channel length (L(C)) and the existence of strips in the channel region limit the number of metallic percolation conducting paths existing between the source and the drain in SCNTF transistors. Increasing the channel aspect ratio threefold resulted in an increase in the on/off current ratio (I(on)/I(off)) by 246%. We also observed that introducing 15 strips into the channel increased I(on)/I(off) by 859%, which was attributed to a reduction in the number of metallic percolation paths formed between the source and the drain. The results show that with a higher aspect ratio and with strips introduced into the channels, the semiconducting behavior of solution-processed SCNTF transistors can be enhanced.
机构:
Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Asada, Yuki
Nihey, Fumiyuki
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NEC Green Innovat Res Labs, Tsukuba, Ibaraki 3058501, Japan
Technol Res Assoc Single Wall Carbon Nanotubes, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Nihey, Fumiyuki
Ohmori, Shigekazu
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Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Ohmori, Shigekazu
Shinohara, Hisanori
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Nagoya Univ, Dept Chem, Chikusa Ku, Nagoya, Aichi 4648602, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Shinohara, Hisanori
Saito, Takeshi
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Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Technol Res Assoc Single Wall Carbon Nanotubes, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
机构:
Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USAPeking Univ, Inst Microelect, Key Lab Microelect Devices & Circuits MOE, Beijing 100871, Peoples R China