Single-walled carbon nanotube (CNT) based thin-film transistors (TFTs) are promising candidates for future electronic devices because of their excellent properties. However, device-to-device performance variability of TFTs can pose challenging problems, which is rooted in the randomness of CNT networks, the variation in individual CNT properties due to change in chirality, and the fabrication imperfections. This paper presents a systematic study of variability in I-V characteristics through a combination of experimental and theoretical analysis of the major sources that cause performance variation. The sources of variation including the percentage of metallic CNTs (m-CNTs), threshold voltage, CNT mean length, and CNT network density have been studied separately. The analysis shows that the presence of m-CNTs is a major source contributing to the performance variation for short channel TFTs, but its effect reduces for large channel length transistors. The threshold voltage is found to be the major source of variation for long channel TFTs. A better consistency in performance can be guaranteed for TFTs with larger channel area, which ensures a smaller variation in CNT network density and CNT mean length. These results provide key insights into the variability estimation of I-V characteristics of CNT-based devices, which is vital for reliability studies of CNT-TFTs based circuits for different electronic applications.
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Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Asada, Yuki
Nihey, Fumiyuki
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NEC Green Innovat Res Labs, Tsukuba, Ibaraki 3058501, Japan
Technol Res Assoc Single Wall Carbon Nanotubes, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Nihey, Fumiyuki
Ohmori, Shigekazu
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Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Ohmori, Shigekazu
Shinohara, Hisanori
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Nagoya Univ, Dept Chem, Chikusa Ku, Nagoya, Aichi 4648602, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Shinohara, Hisanori
Saito, Takeshi
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Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Technol Res Assoc Single Wall Carbon Nanotubes, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
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Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USAPeking Univ, Inst Microelect, Key Lab Microelect Devices & Circuits MOE, Beijing 100871, Peoples R China
机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Jeong, Minho
Choi, Eunsuk
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Choi, Eunsuk
Lee, Kunhak
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lee, Kunhak
Kim, Jinoh
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Jinoh
Kim, Ahsung
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Ahsung
Chun, Sungwoo
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Chun, Sungwoo
Lim, Chaehyun
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机构:Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lim, Chaehyun
Lee, Seung-Beck
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Hanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Hanyang Univ, Inst Nanosci & Technol, Seoul 133791, South KoreaHanyang Univ, Dept Elect Engn, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea