Temperature-dependent characteristics of cylindrical gate-all-around twin silicon nanowire MOSFETs (TSNWFETs)

被引:22
|
作者
Cho, Keun Hwi [1 ]
Suk, Sung Dae
Yeoh, Yun Young
Li, Ming
Yeo, Kyoung Hwan
Kim, Dong-Won
Park, Donggun
Lee, Won-Seong
Jung, Young Chai
Hong, Byung Hak
Hwang, Sung Woo
机构
[1] Samsung Elect Co, Ctr Res & Dev, Yongin 449711, South Korea
[2] Korea Univ, Sch Elect Engn, Res Ctr Time Domain Nano Funct Devices, Seoul 136701, South Korea
关键词
gate-all-around (GAA); nanowire; temperature;
D O I
10.1109/LED.2007.909868
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The characteristics of cylindrical gate-all-around twin silicon nanowire field-effect transistors with a radius of 5 nm have been measured in temperatures T ranging from 4 to 300 K. The T dependence of the off-current suggests that thermal generation in the channel is the main leakage mechanism. The T dependence of the subthreshold swing exhibits no body effects but shows degradations due to slight differences in the threshold voltages and in the body effect constants of the twin nanowires. The T dependence of the peak normalized transconductance g(m)/V-DS gives a clue of 1-D phonon scattering and suggests that surface roughness scattering at the nanowire wall is dominant at low T values.
引用
收藏
页码:1129 / 1131
页数:3
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