Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates

被引:224
|
作者
Saitoh, Yu [1 ]
Sumiyoshi, Kazuhide [1 ]
Okada, Masaya [1 ]
Horii, Taku [1 ]
Miyazaki, Tomihito [1 ]
Shiomi, Hiromu [1 ]
Ueno, Masaki [1 ]
Katayama, Koji [1 ]
Kiyama, Makoto [1 ]
Nakamura, Takao [1 ]
机构
[1] Sumitomo Elect Ind Ltd, Semicond Technol R&D Labs, Itami, Hyogo 6640016, Japan
关键词
YELLOW LUMINESCENCE; GALLIUM VACANCIES; CARBON; GAAS;
D O I
10.1143/APEX.3.081001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Vertical GaN Schottky barrier diodes (SBDs) were fabricated on freestanding GaN substrates with low dislocation density High quality n-GaN drift-layer with an electron mobility of 930 cm(2) V(-1) s(-1) was obtained by optimizing the growth conditions by reducing the intensity of yellow luminescence using conventional photoluminescence measurements The specific on-resistance (R(on) A) and the breakdown voltage (V(B)) of the SBDs were 0 71 m Omega cm(2) and over 1100 V. respectively The figure of merit (V(B)(2)/R(on) A) was 1 7 GW/cm(2), which is the highest value among previously reported SBDs for both GaN and SiC (C) 2010 The Japan Society of Applied Physics
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页数:3
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