Power AlGaN/GaN HFETs with excellent Vb/Ron for high speed switching

被引:0
|
作者
Ikeda, Nariaki [1 ]
Kato, Kazuo [1 ]
Li, Jiang [1 ]
Kaya, Syusuke [1 ]
Nomura, Takehiko [1 ]
Masuda, Mitsuru [1 ]
Yoshida, Seikoh [1 ]
机构
[1] Furukawa Elect Corp Ltd, Yokohama Res & Dev Labs, Nishi Ku, Yokohama, Kanagawa 2200073, Japan
关键词
D O I
10.1002/pssc.200778443
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
AlGaN/GaN HFETs with a large current and a high breakdown voltage were fabricated. We examined the switching characteristics and capacitance parameters such as an input capacitance (C-iss), a reverse transfer capacitance (C-rss), a gate to a source charge (Q(gs)) and a gate to a drain charge (Q(gd)), using the GaN HFET devices. An order to confirm the advantage for the high-frequency switching operation of the GaN HFETs compared with Si devices, capacitance parameters and the figure of merit (FOM) Vb/(Ron) for a switching capability were examined. As a result, a law Ciss, Crss, and Qg were obtained and the FOMs of GaN HFETs have one order of magnitude larger than those of Si power devices.
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收藏
页码:1920 / 1922
页数:3
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