Influence of magnetron configuration on CoCr films sputtered on flexible substrates

被引：15
|
作者：
Veldeman, J [1 ]
Jia, H [1 ]
Burgelman, M [1 ]
机构：
[1] State Univ Ghent, Dept Elect & Informat Syst, B-9000 Ghent, Belgium
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 193卷 / 1-3期
关键词：
PET substrate; DC magnetron sputtering; longitudinal magnetic thin films; ion bombardment;
D O I：
10.1016/S0304-8853(98)00416-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The aim of this work is to investigate the influence of the magnetron configuration on the magnetic properties of DC magnetron sputtered Co88Cr12 films on a PET substrate. The parameters of each magnetron configuration are calculated or measured. The influence of the most relevant sputtering parameters, such as a Cr underlayer and sputter pressure, is investigated for all configurations. The magnetic properties of the sputtered films were measured with a VSM. Microscopic characterisation of the films is done with XRD measurements. Changes in magnetic and microscopic properties of the films are explained in terms of charged particle bombardment of the substrate during sputtering. Using a Cr underlayer and a rather high pressure can improve the magnetic properties of the film drastically. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：128 / 131
页数：4
相关论文
共 50 条
  • [41] Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films
    Duquenne, C.
    Tessier, P. Y.
    Besland, M. P.
    Angleraud, B.
    Jouan, P. Y.
    Aubry, R.
    Delage, S.
    Djouadi, M. A.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (06)
  • [42] HEAT-TREATMENT EFFECTS OF COCR SPUTTERED FILMS
    JANG, PW
    LEE, TD
    KIM, YH
    KANG, T
    IEEE TRANSACTIONS ON MAGNETICS, 1990, 26 (05) : 1623 - 1625
  • [43] Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films
    Duquenne, C.
    Tessier, P.Y.
    Besland, M.P.
    Angleraud, B.
    Jouan, P.Y.
    Aubry, R.
    Delage, S.
    Djouadi, M.A.
    Journal of Applied Physics, 2008, 104 (06):
  • [44] Influence of Sputtering Power on the Properties of Magnetron Sputtered Tin Selenide Films
    Mars, Krzysztof
    Salega-Starzecki, Mateusz
    Zawadzka, Kinga M.
    Godlewska, Elzbieta
    MATERIALS, 2024, 17 (13)
  • [45] Substrate effects in magnetron sputtering of CoCrTa/Cr films on flexible substrates
    Veldeman, J
    Jia, H
    Burgelman, M
    SURFACE SCIENCE, 2000, 454 (01) : 904 - 908
  • [46] Deposition of titanium nitride films on the flexible Polycarbonate substrates by magnetron sputtering
    Liu, Yan-Hui
    Gao, Jing-Long
    Liang, Jia-Jing
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2015, 9 (3-4): : 436 - 438
  • [47] Si diffusion in magnetron sputtered silicon carbide films deposited on silicon and carbon substrates
    Gruber, W.
    Geckle, U.
    Bruns, M.
    Schmidt, H.
    THIN SOLID FILMS, 2009, 518 (01) : 396 - 398
  • [48] Flexible electrochromics: magnetron sputtered tungsten oxide (WO3-x) thin films on Lexan (optically transparent polycarbonate) substrates
    Kumar, K. Uday
    Murali, Dhanya S.
    Subrahmanyam, A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2015, 48 (25)
  • [49] RESIDUAL STRESS IN RF MAGNETRON SPUTTERED ZnO THIN FILMS on GaP SUBSTRATES AND NANOWIRES
    Buc, D.
    Kovac, J.
    Kutis, V.
    Murin, J.
    Caplovicova, M.
    Skriniarova, J.
    Novak, P.
    Novak, J.
    Hasenorl, S.
    Dobrocka, E.
    11TH WORLD CONGRESS ON COMPUTATIONAL MECHANICS; 5TH EUROPEAN CONFERENCE ON COMPUTATIONAL MECHANICS; 6TH EUROPEAN CONFERENCE ON COMPUTATIONAL FLUID DYNAMICS, VOLS II - IV, 2014, : 2846 - 2856
  • [50] STRUCTURE-MAGNETIC PROPERTY CORRELATIONS OF CROSS-SECTIONS OF DC MAGNETRON SPUTTERED COCR THIN-FILMS
    RAVIPATI, DP
    NARAYAN, PB
    SIVERTSEN, JM
    JUDY, JH
    JOURNAL DE PHYSIQUE, 1988, 49 (C-8): : 1999 - 2000
12345