Influence of magnetron configuration on CoCr films sputtered on flexible substrates

被引：15
|
作者：
Veldeman, J [1 ]
Jia, H [1 ]
Burgelman, M [1 ]
机构：
[1] State Univ Ghent, Dept Elect & Informat Syst, B-9000 Ghent, Belgium
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 193卷 / 1-3期
关键词：
PET substrate; DC magnetron sputtering; longitudinal magnetic thin films; ion bombardment;
D O I：
10.1016/S0304-8853(98)00416-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The aim of this work is to investigate the influence of the magnetron configuration on the magnetic properties of DC magnetron sputtered Co88Cr12 films on a PET substrate. The parameters of each magnetron configuration are calculated or measured. The influence of the most relevant sputtering parameters, such as a Cr underlayer and sputter pressure, is investigated for all configurations. The magnetic properties of the sputtered films were measured with a VSM. Microscopic characterisation of the films is done with XRD measurements. Changes in magnetic and microscopic properties of the films are explained in terms of charged particle bombardment of the substrate during sputtering. Using a Cr underlayer and a rather high pressure can improve the magnetic properties of the film drastically. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：128 / 131
页数：4
相关论文
共 50 条
  • [21] WALL ENERGY AND EXCHANGE STIFFNESS IN COCR FILMS SPUTTERED ON LOW-TEMPERATURE SUBSTRATES
    HONDA, S
    TAKAHASHI, K
    KUSUDA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (05): : L593 - L596
  • [22] Magnetic properties and magnetization process in CoCr films sputtered on low-temperature substrates
    Honda, Shigeo
    Takahashi, Kenichi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 (12): : 2278 - 2285
  • [23] Influence of RF Power On Magnetron Sputtered AZO Films
    Agarwal, Mohit
    Modi, Pankaj
    Dusane, R. O.
    SOLID STATE PHYSICS, VOL 57, 2013, 1512 : 764 - 765
  • [24] Structure and Corrosion of Magnetron Sputtered Pure Mg Films on Silicon Substrates
    Stoermer, Michael
    Blawert, Carsten
    Hagen, Heiko
    Heitmann, Volker
    Dietzel, Wolfgang
    PLASMA PROCESSES AND POLYMERS, 2007, 4 : S557 - S561
  • [25] Defect generation mechanism in magnetron sputtered metal films on PMMA substrates
    Junshan Liu
    Liufeng He
    Zheng Xu
    Xinyue Zhao
    Yue Zhang
    Riye Xue
    Guojun Ma
    Mancang Song
    Liding Wang
    Journal of Materials Science: Materials in Electronics, 2019, 30 : 14847 - 14854
  • [26] Defect generation mechanism in magnetron sputtered metal films on PMMA substrates
    Liu, Junshan
    He, Liufeng
    Xu, Zheng
    Zhao, Xinyue
    Zhang, Yue
    Xue, Riye
    Ma, Guojun
    Song, Mancang
    Wang, Liding
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2019, 30 (16) : 14847 - 14854
  • [27] MAGNETIC-PROPERTIES AND MAGNETIZATION PROCESS IN COCR FILMS SPUTTERED ON LOW-TEMPERATURE SUBSTRATES
    HONDA, S
    TAKAHASHI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (12): : 2278 - 2285
  • [28] DISPERSION OF EASY AXIS IN COCR SPUTTERED FILMS
    HONDA, S
    KUSUDA, T
    IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (05) : 1444 - 1446
  • [29] ELECTRON-MICROSCOPY OF COCR SPUTTERED FILMS
    OHKOSHI, M
    TOBA, H
    HONDA, S
    KUSUDA, T
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1983, 35 (1-3) : 266 - 268
  • [30] DISTRIBUTION OF HYSTERESIS LOSS IN SPUTTERED COCR FILMS
    LODDER, JC
    LI, CZ
    POPMA, TJA
    JOURNAL DE PHYSIQUE, 1988, 49 (C-8): : 2005 - 2006
12345