The annealing effect on damp heat stability of AGZO thin films prepared by DC moving magnetron sputtering

被引:16
|
作者
Kang, Jong-Ho [1 ,2 ]
Lee, Myung-Hyun [1 ]
Kim, Dae Wook [1 ,2 ]
Lim, Young Soo [1 ]
Seo, Won-Seon [1 ]
Choi, Heon-Jin [2 ]
机构
[1] Korea Inst Ceram Engn & Technol, Green Ceram Div, Energy Mat Ctr, Seoul 153801, South Korea
[2] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
关键词
TCO; AGZO; DC sputtering; Damp heat stability; GA-DOPED ZNO; TEMPERATURE; GROWTH;
D O I
10.1016/j.cap.2011.01.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the research, we report the results on the damp heat stability test for the annealing effect of aluminum and gallium co-doped ZnO (AGZO) thin films. The prepared AGZO thin films (AGZO-RT) by DC moving magnetron sputtering at room temperature were exhibited thicknesses of 150 nm and the sheet resistances of 60-70 Omega/sq. And the part of the deposition, it was annealed in vacuum at 300 degrees C for 18 min. The damp heat tests of the two samples (AGZO-RT, AGZO-AN) were carried out in a chamber with 90% of relative humidity and 60 degrees C of temperature. As the time of the damp heat test increased, the electrical properties of AGZO-RT were more deteriorated than AGZO-AN. The sheet resistance by damp heat to the two samples increased more than three times after 1000 h. The various analytical methods were measured to the electrical, optical and structural properties in the damp heat condition tested about the two thin films, and the results will be discussed. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:S333 / S336
页数:4
相关论文
共 50 条
  • [31] Effect of Annealing Temperature on Structure and Optical Properties of Ta2O5 thin films Prepared by DC Magnetron Sputtering
    Plirdpring, T.
    Horprathum, M.
    Chananonnawathorn, C.
    Eiamchai, P.
    Harnwunggmoung, A.
    Boonpichayapha, T.
    Lorwongtragool, P.
    Charoenphakdee, A.
    [J]. APPLIED PHYSICS AND MATERIAL APPLICATIONS, 2013, 770 : 149 - +
  • [32] AIR AND VACUUM ANNEALING EFFECT ON THE HIGHLY CONDUCTING AND TRANSPARENT PROPERTIES OF THE UNDOPED ZINC OXIDE THIN FILMS PREPARED BY DC MAGNETRON SPUTTERING
    Radjehi, Lamia
    Aissani, Linda
    Djelloul, Abdelkader
    Saoudi, Abdenour
    Lamri, Salim
    Nomenyo, Komla
    Lerondel, Gilles
    Sanchette, Frederic
    [J]. METALLURGICAL & MATERIALS ENGINEERING, 2023, 29 (01) : 37 - 52
  • [33] Surface and Electrical Properties of NiCr Thin Films Prepared by DC Magnetron Sputtering
    ZHOU Jicheng TIAN Li YAN Jianwu (School of Physics Science and Technology
    [J]. Journal of Wuhan University of Technology(Materials Science), 2008, (02) : 159 - 162
  • [34] Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering
    Reddy, A. Mallikarjuna
    Reddy, A. Sivasankar
    Lee, Kee-Sun
    Reddy, P. Sreedhara
    [J]. SOLID STATE SCIENCES, 2011, 13 (02) : 314 - 320
  • [35] The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge
    Kavitha, A.
    Kannan, R.
    Reddy, P. Sreedhara
    Rajashabala, S.
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (10) : 10427 - 10434
  • [36] Transparent conductive cadmium indate thin films prepared by dc magnetron sputtering
    Babu, PM
    Rao, GV
    Uthanna, S
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 2003, 78 (01) : 208 - 213
  • [37] Surface and electrical properties of NiCr thin films prepared by DC magnetron sputtering
    Zhou Jieheng
    Tian Li
    Yan Jianwu
    [J]. JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2008, 23 (02): : 159 - 162
  • [38] Niobium oxide electrochromic thin films prepared by reactive DC magnetron sputtering
    Yoshimura, K.
    Miki, T.
    Iwama, S.
    Tanemura, S.
    [J]. Japanese Journal of Applied Physics, Part 2: Letters, 1995, 34 (10 A):
  • [39] Nanostructured CrN thin films prepared by reactive pulsed DC magnetron sputtering
    Elangovan, T.
    Kuppusami, P.
    Thirumurugesan, R.
    Ganesan, V.
    Mohandas, E.
    Mangalaraj, D.
    [J]. MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 167 (01): : 17 - 25
  • [40] Study on copper nitride thin films prepared by reactive DC magnetron sputtering
    Li Xing-ao
    Yang Jian-Ping
    Li Yong-Tao
    Wang Li-Xia
    Wang Hai-Yun
    [J]. FUNCTIONAL AND ELECTRONIC MATERIALS, 2011, 687 : 706 - +