Fabrication of sub-20 nm patterns using dopamine chemistry in self-aligned double patterning

A self-aligned double patterning approach using a dopamine chemistry-inspired coating technique has been developed for the fabrication of sub-20 nm patterns. Poly(methyl methacrylate) (PMMA) films were patterned by nanoimprint lithography to form relief features. A thin layer of polydopamine (PDA) was conformally deposited on the surface of the PMMA pattern sidewalls to form a spacer layer. After etching the surface of the PDA layer from the horizontal surfaces and subsequently removing the PMMA template, free-standing PDA sidewall patterns remained that essentially doubled the original PMMA pattern density with decreased feature dimensions as compared to the initial PMMA template structures. The critical dimension of the PDA patterns can be tuned to approximate to 20 nm by controlling the PDA deposition conditions and further reduced to approximate to 13 nm by thermal carbonization of the PDA. Both simple lines and more complex rhombic ring features were fabricated by this technique to demonstrate its capacity for replicating arbitrary patterns. This work represents a simple and scalable strategy for preparing well-defined nanostructures with feature sizes usually only accessible via complex leading edge lithographic methods.