Modulation of resistive switching in Pt/LiCoO2/SiO2/Si stacks

被引:4
|
作者
Hu, Qi [1 ]
Huang, Anping [1 ]
Zhang, Xinjiang [1 ]
Li, Runmiao [1 ]
Gao, Qin [1 ]
Wang, Meng [1 ]
Wang, Mei [1 ]
Shi, Hongliang [1 ]
Xiao, Zhisong [1 ]
Chu, Paul K. [2 ,3 ]
机构
[1] Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
[2] City Univ Hong Kong, Dept Phys, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China
[3] City Univ Hong Kong, Dept Mat Sci & Engn, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
LICOO2; THIN-FILMS; METAL TRANSITION; LITHIUM STORAGE; BATTERIES; DIFFUSION; MEMRISTORS; TRANSPORT; SILICON; SIO2;
D O I
10.1007/s10854-019-00768-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Pt/LiCoO2/SiO2/Si stacks are fabricated by pulsed laser deposition and annealed at different annealing temperature. Pt/LiCoO2/SiO2/Si stacks exhibit lower current and higher high resistance state/low resistance state ratio than other stacks with homogeneous resistive switching. It is found that resistive switching behavior of Pt/LiCoO2/SiO2/Si stacks can be modulated by LiCoO2 crystal structures. The Pt/LiCoO2/SiO2/Si stacks with R-3m LiCoO2 phase show larger maximum currents and better state stability than samples with amorphous LiCoO2, and samples with amorphous or R-3m LiCoO2 phase exhibit non-homogeneous or homogeneous resistive switching, respectively. The reasons for the different resistive switching behaviors are investigated and discussed. These findings provide insights into how to improve the performance of Pt/LiCoO2/SiO2/Si stacks and a further understanding of the homogeneous resistive switching behavior.
引用
收藏
页码:4753 / 4759
页数:7
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