EELS investigation of Pd thin film growth on aluminum oxide substrate

被引:7
|
作者
Stará, I
Gruzza, B
Matolín, V
机构
[1] Charles Univ, Dept Elect & Vacuum Phys, CR-18000 Prague 8, Czech Republic
[2] Univ Blaise Pascal, LASMEA, F-63177 Aubiere, France
关键词
EELS; thin film growth; Pd; aluminum oxide;
D O I
10.1016/S0368-2048(00)00337-6
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Electron energy loss spectroscopy (EELS) operated at energies from 250 to 1500 eV was used for coverage analysis of supported non-continuous layers. The alumina supported very thin Pd films were prepared by depositing small amounts of Pd on thermally oxidized Al substrate. The film growth was investigated via variations of intensity of excited Pd plasmons and of alumina energy losses. The overlayer coverage was determined from the relative contribution of deposit and substrate signal to the composite spectra taking into account the backreflecting capacity of both materials and loss event probabilities [Surf. Rev. Lett. 6 (1999) 801]. The results show high sensitivity of the EELS method to deposit thickness and continuity. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:575 / 580
页数:6
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