Pulsed laser deposition of (001) textured LiNbO3 films on Al2O3/SiO2/Si substrate

被引：24
|
作者：
Hu, WS [1 ]
Liu, ZG [1 ]
Wu, ZC [1 ]
Liu, JM [1 ]
Chen, XY [1 ]
Feng, D [1 ]
机构：
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 1999年 / 141卷 / 1-2期
基金：
中国国家自然科学基金;
关键词：
thin film; pulsed laser deposition;
D O I：
10.1016/S0169-4332(98)00890-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
On SiO2/Si substrate (Si wafer with thermally oxidized SiO2 coating), only polycrystalline LiNbO3 thin films were normally obtained. In this work, we found that an ultrathin layer of predeposited Al2O3 layer an SiO2/Si has greatly mediated the growth pattern of the subsequently deposited LiNbO3 films. As a result, highly or completely (001) textured LiNbO3 films were achieved depending on the substrate temperature and the thickness of Al2O3 as well. The textured growth phenomenon is discussed in terms of surface energy relation. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：197 / 200
页数：4
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