Pulsed laser deposition of LiNbO3/LiTaO3 multilayer films on SiO2/Si(100) substrate

LiNbO3/LiTaO3 (LN/LT) multilayer films were grown on Si (100) wafer coated with SiO2 buffer by pulsed laser deposition technique. Both LN and LT layers are polycrystalline exhibiting some degree of c-texture and their compositions were nearly stoichiometric. The surface of films was smooth, crack free and lacked large droplets. The interface between films and substrates was sharp and no compositional interdiffusion were detected between them. The optical waveguide properties were demonstrated. Both TE and TM modes were excited and light propagates well in the alternating LN/LT layers. The average refractive index and thickness of the LN/LT multilayer film were calculated.