Effects of tetrahedral amorphous carbon film deposited on dental cobalt-chromium alloys on bacterial adhesion
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作者:
Chen, Gang
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Fourth Mil Med Univ, Sch Stomatol, Dept Prosthodont, Xian 710032, Shaanxi Provinc, Peoples R China
PLA, Hosp 32, Dept Stomatol, Xian 710054, Shaanxi Provinc, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Chen, Gang
[2
,3
]
Wang, Zhongyi
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Fourth Mil Med Univ, Sch Stomatol, Dept Prosthodont, Xian 710032, Shaanxi Provinc, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Wang, Zhongyi
[2
]
Wang, Hui
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Fourth Mil Med Univ, Sch Stomatol, Dept Prosthodont, Xian 710032, Shaanxi Provinc, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Wang, Hui
[2
]
Zhao, Xiaolin
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机构:
PLA, Hosp 32, Dept Stomatol, Xian 710054, Shaanxi Provinc, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Zhao, Xiaolin
[3
]
Hu, Jiang
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Jilin Med Coll, Dept Stomatol, Affiliated Hosp, Changchun 132013, Jilin Province, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Hu, Jiang
[4
]
Wang, Shaohai
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Second Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Wang, Shaohai
[1
]
Zhang, Shaofeng
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Fourth Mil Med Univ, Sch Stomatol, Dept Prosthodont, Xian 710032, Shaanxi Provinc, Peoples R ChinaSecond Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
Zhang, Shaofeng
[2
]
机构:
[1] Second Mil Med Univ, Dept Stomatol, Changhai Hosp, Shanghai 200433, Peoples R China
[2] Fourth Mil Med Univ, Sch Stomatol, Dept Prosthodont, Xian 710032, Shaanxi Provinc, Peoples R China
[3] PLA, Hosp 32, Dept Stomatol, Xian 710054, Shaanxi Provinc, Peoples R China
[4] Jilin Med Coll, Dept Stomatol, Affiliated Hosp, Changchun 132013, Jilin Province, Peoples R China
The dental cobalt-chromium alloys are an important biomaterial used in making artificial dentures. Bacterial adhesion to cobalt-chromium alloys usually results in severe complications such as periodontal infection, secondary caries, and denture stomatitis, which have severe adverse impacts on human health. Therefore, an effective method is needed to reduce the bacterial adhesion to dental cobalt-chromium alloys. The aim of this study was to investigate the effects of ta-C films deposited on a dental cobalt-chromium alloy on the adhesion of Streptococcus mutans (ATCC175), Actinomyces viscosus (ATCC19246) and Candida albicans (ATCC76615). A filtered cathodic vacuum arc (FCVA) technique was used to coat the cobalt-chromium alloy with a ta-C film. Atomic force microscopy (AFM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to analyze the surface characteristics of the coating. Surface roughness was detected. Surface free energy and its components were calculated by measuring the contact angle. The results showed that the maximum sp(3) fraction was achieved at 200 V substrate bias voltage. Compared with uncoated specimens, the ta-C film coated specimens had a lower surface roughness, a higher surface energy and a higher hydrophilicity. Most importantly, the adhesion of the three tested bacterial strains to the ta-C film coated cobalt-chromium alloy was significantly decreased. These results showed that ta-C film surface treatment could significantly reduce the bacterial adhesion to dental cobalt-chromium alloys, suggesting the potential of ta-C film surface treatment in artificial denture applications. (C) 2012 Elsevier B.V. All rights reserved.
机构:
Univ Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Aleixo, L. S.
Ortega, M. R.
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Univ Fed Rio Grande do Sul, Lab Pesquisa Corrosao LAPEC, Programa Posgrad Engn Minas Metal & Mat, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Ortega, M. R.
Versteg, A.
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Univ Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Versteg, A.
Falcade, T.
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Univ Fed Rio Grande do Sul, Lab Pesquisa Corrosao LAPEC, Programa Posgrad Engn Minas Metal & Mat, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Falcade, T.
Aguzzoli, C.
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Univ Caxias Sul UCS, Programa Posgrad Engn & Ciencia Mat PGMAT, Rua Francisco Getulio Vargas 1130, BR-95070560 Caxias Do Sul, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Aguzzoli, C.
Malfatti, C.
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Univ Fed Rio Grande do Sul, Lab Pesquisa Corrosao LAPEC, Programa Posgrad Engn Minas Metal & Mat, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil
Malfatti, C.
Tamborim, S. M.
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Univ Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Quim, Lab Eletroquim & Corrosao LABECORR, Programa Posgrad Quim, Ave Bento Goncalves 9500, BR-91501970 Porto Alegre, RS, Brazil