Optical and electron beam studies of gamma-irradiated AlGaN/GaN high-electron-mobility transistors

被引:6
|
作者
Yadav, Anupama [1 ]
Glasscock, Cameron [1 ]
Flitsiyan, Elena [1 ]
Chernyak, Leonid [1 ]
Lubomirsky, Igor [2 ]
Khodorov, Sergey [2 ]
Salzman, Joseph [3 ]
Meyler, Boris [3 ]
Coppola, Carlo [4 ]
Guay, Sebestian [4 ]
Boivin, Jasques [4 ]
机构
[1] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[2] Weizmann Inst Sci, Dept Mat & Interfaces, IL-76100 Rehovot, Israel
[3] Technion Israel Inst Technol, Dept Elect Engn, IL-3200003 Haifa, Israel
[4] Nordion, Laval, PQ H7V 3S8, Canada
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 2016年 / 171卷 / 3-4期
关键词
High-electron-mobility transistors; activation energy; diffusion length; lifetime; gamma-irradiation; CARRIER DIFFUSION-LENGTH; V NITRIDE SEMICONDUCTORS; GALLIUM NITRIDE; DOPED GAN; RADIATION; DEVICES;
D O I
10.1080/10420150.2016.1170018
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
The impact of Co-60 gamma-irradiation on n-channel AlGaN/GaN high-electron-mobility transistors was studied by means of temperature-dependent electron beam-induced current (EBIC) and cathodoluminescence (CL) techniques. For the doses up to similar to 250 Gy, an enhancement of minority carrier transport was observed as evident from the EBIC measurements. This enhancement is associated with internal electron irradiation induced by the primary gamma photons. For the doses above similar to 250 Gy, deterioration in minority carrier transport was explained by carrier scattering on radiation-induced defects. It is shown that calculated activation energy from the EBIC and CL measurements follows exactly the same trend, which implies that the same underlying phenomenon is responsible for observed findings.
引用
收藏
页码:223 / 230
页数:8
相关论文
共 50 条
  • [31] Effects of Surface Oxidation of AlGaN on DC Characteristics of AlGaN/GaN High-Electron-Mobility Transistors
    Tajima, Masafumi
    Kotani, Junji
    Hashizume, Tamotsu
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (02)
  • [32] Effects of surface oxidation of AlGaN on DC characteristics of AlGaN/GaN high-electron-mobility transistors
    Graduate School of Information and Science Technology, Research Center for Integrated Quantum Electronics , Hokkaido University, Sapporo 060-8628, Japan
    Jpn. J. Appl. Phys., 2
  • [33] Undoped High-Resistance GaN Buffer Layer for AlGaN/GaN High-Electron-Mobility Transistors
    T. V. Malin
    D. S. Milakhin
    I. A. Aleksandrov
    V. E. Zemlyakov
    V. I. Egorkin
    A. A. Zaitsev
    D. Yu. Protasov
    A. S. Kozhukhov
    B. Ya. Ber
    D. Yu. Kazantsev
    V. G. Mansurov
    K. S. Zhuravlev
    Technical Physics Letters, 2019, 45 : 761 - 764
  • [34] Studies of AlGaN/GaN high-electron-mobility transistors on 4-in. diameter Si and sapphire substrates
    Arulkumaran, S
    Egawa, T
    Ishikawa, H
    SOLID-STATE ELECTRONICS, 2005, 49 (10) : 1632 - 1638
  • [35] Undoped High-Resistance GaN Buffer Layer for AlGaN/GaN High-Electron-Mobility Transistors
    Malin, T. V.
    Milakhin, D. S.
    Aleksandrov, I. A.
    Zemlyakov, V. E.
    Egorkin, V. I.
    Zaitsev, A. A.
    Protasov, D. Yu.
    Kozhukhov, A. S.
    Ber, B. Ya.
    Kazantsev, D. Yu.
    Mansurov, V. G.
    Zhuravlev, K. S.
    TECHNICAL PHYSICS LETTERS, 2019, 45 (08) : 761 - 764
  • [36] AlGaN/GaN high electron mobility transistors irradiated with 17 MeV protons
    Kim, Hong-Yeol
    Kim, Jihyun
    Yun, Sang Pil
    Kim, Kye Ryung
    Anderson, Travis J.
    Ren, Fan
    Pearton, S. J.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (07) : H513 - H515
  • [37] Fabrication and characterization of V-gate AlGaN/GaN high-electron-mobility transistors
    张凯
    曹梦逸
    陈永和
    杨丽媛
    王冲
    马晓华
    郝跃
    Chinese Physics B, 2013, (05) : 488 - 491
  • [38] RF performance of AlGaN/GaN high-electron-mobility transistors grown on silicon (110)
    Millimeter-Wave Electronics Group, ETH-Zürich, Gloriastrasse 35, CH-8092 Zürich, Switzerland
    不详
    Appl. Phys. Express, 6
  • [39] Characteristics in AlN/AlGaN/GaN Multilayer-Structured High-Electron-Mobility Transistors
    Hu Gui-Zhou
    Yang Ling
    Yang Li-Yuan
    Quan Si
    Jiang Shou-Gao
    Ma Ji-Gang
    Ma Xiao-Hua
    Hao Yue
    CHINESE PHYSICS LETTERS, 2010, 27 (08)
  • [40] Influence of the Diamond Layer on the Electrical Characteristics of AlGaN/GaN High-Electron-Mobility Transistors
    Zheng, Xue-Feng
    Wang, Ao-Chen
    Hou, Xiao-Hui
    Wang, Ying-Zhe
    Wen, Hao-Yu
    Wang, Chong
    Lu, Yang
    Mao, Wei
    Ma, Xiao-Hua
    Hao, Yue
    CHINESE PHYSICS LETTERS, 2017, 34 (02)