Study of Li diffusion in thin film of Re annealed at high temperatures

被引：1

作者：

Cannavo, A. ^{[1
]}

Vacik, J. ^{[1
]}

Hnatowicz, V ^{[1
]}

Ceccio, G. ^{[1
]}

Horak, P. ^{[1
]}

Lavrentiev, V ^{[1
]}

Koster, U. ^{[2
]}

Pasold, G. ^{[3
]}

机构：

[1] Czech Acad Sci, Nucl Phys Inst, Husinec Rez 25068, Czech Republic

[2] Inst Laue Langevin, F-38042 Grenole, France

[3] Friedrih Shiller Univ Jena, Inst Festkorphys, D-07743 Jena, Germany

来源：

JOURNAL OF INSTRUMENTATION | 2020年 / 15卷 / 05期

关键词：

Inspection with neutrons; Instrumentation for radioactive beams (fragmentation devices; fragment and isotope; separators incl. ISOL; isobar separators; ion and atom traps; weak-beam diagnostics; radioactive-beam ion sources); Interaction of radiation with matter; RADIOACTIVE-ION-BEAMS; LITHIUM; RELEASE;

D O I：

10.1088/1748-0221/15/05/P05010

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Depth profiles of Li-6 implanted into high-melting point rhenium refractory metal has been measured for as-implanted, as well as thermally annealed samples using a non-destructive Thermal Neutron Depth Profiling technique at the LWR-15 research reactor in Rez. The Gaussianlike shape, typical for as-implanted Li-depth profile, is preserved after the thermal annealing at high temperature demonstrating the activation of the Li atom diffusion process at the Re-target. The diffusion coefficient at 1830 degrees C has been evaluated by the comparison of the Li profiles before and after the thermal annealing. This study aims to investigate the applicability of Re metal in ISOL related applications.

引用

页数：9

共 50 条

[31] DIFFUSION RATE OF LI IN SI AT LOW TEMPERATURES
PELL, EM
PHYSICAL REVIEW, 1960, 119 (04): : 1222 - 1225
[32] X-ray photoelectron study of annealed Co thin film on Si surface
Sharma, A.
Tripathi, S.
Shripathi, T.
APPLIED SURFACE SCIENCE, 2009, 256 (02) : 530 - 535
[33] Photocatalytic activity of high-vacuum annealed CdS-TiO2 thin film
Biswas, S.
Hossain, M. F.
Takahashi, T.
Kubota, Y.
Fujishima, A.
THIN SOLID FILMS, 2008, 516 (21) : 7313 - 7317
[34] A study of the effect of the fabrication process on diffusion in a layered thin film
Hirasawa, T
Kotera, H
Yamamoto, T
Shima, S
MICROSYSTEM TECHNOLOGIES, 1999, 5 (04) : 169 - 172
[35] A study of the effect of the fabrication process on diffusion in a layered thin film
Hirasawa T.
Kotera H.
Yamamoto T.
Shima S.
Microsystem Technologies, 1999, 5 (4) : 169 - 172
[36] Spectroscopic study on water diffusion in aromatic polyamide thin film
Jin, Ying
Wang, Wei
Su, Zhaohui
JOURNAL OF MEMBRANE SCIENCE, 2011, 379 (1-2) : 121 - 130
[37] Thin film rechargeable Li batteries
Jones, Steven D., 1994, Elsevier Science Publishers B.V., Amsterdam, Netherlands (69) : 3 - 4
[38] Distribution of Kondo temperatures in a thin film
Crépieux, A
Lacroix, C
PHYSICAL REVIEW B, 2000, 61 (10) : 6785 - 6789
[39] Lithium diffusion in Li4Ti5O12 at high temperatures
Vijayakumar, M.
Kerisit, Sebastien
Rosso, Kevin M.
Burton, Sarah D.
Sears, Jesse A.
Yang, Zhenguo
Graff, Gordon L.
Liu, Jun
Hu, Jianzhi
JOURNAL OF POWER SOURCES, 2011, 196 (04) : 2211 - 2220
[40] Study on the Li and B co-doped diamond thin film
Lee, WS
Yu, J
Lee, TY
JOURNAL OF MATERIALS SCIENCE, 2005, 40 (20) : 5549 - 5551

← 1 2 3 4 5 →