Twin-electron biprism

被引:4
|
作者
Ikeda, M. [1 ]
Sugawara, A. [1 ]
Harada, K. [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Hiki, Saitama 3500395, Japan
来源
JOURNAL OF ELECTRON MICROSCOPY | 2011年 / 60卷 / 06期
关键词
electron biprism; electron holography; double-electron biprism interferometry; deflection angle; Fresnel fringes; HOLOGRAPHY; SYSTEM;
D O I
10.1093/jmicro/dfr071
中图分类号
TH742 [显微镜];
学科分类号
摘要
In order to obtain a large deflection angle without increasing the applied voltage to an electron biprism, we have developed a 'twin-electron biprism' (TBP), which is composed of two filament electrodes and a pair of ground plates. The observed interference-fringe spacing revealed that the deflection angle created by a TBP was about twice larger than that by a 'conventional electron biprism'. Also, we have suggested, in a double-electron biprism interferometry, the optimal disposition of a TBP for reducing the intensity of Fresnel fringes recorded in an electron hologram.
引用
收藏
页码:353 / 358
页数:6
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