Twin-electron biprism

被引：4

作者：

Ikeda, M. ^{[1
]}

Sugawara, A. ^{[1
]}

Harada, K. ^{[1
]}

机构：

[1] Hitachi Ltd, Cent Res Lab, Hiki, Saitama 3500395, Japan

来源：

JOURNAL OF ELECTRON MICROSCOPY | 2011年 / 60卷 / 06期

关键词：

electron biprism; electron holography; double-electron biprism interferometry; deflection angle; Fresnel fringes; HOLOGRAPHY; SYSTEM;

D O I：

10.1093/jmicro/dfr071

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

In order to obtain a large deflection angle without increasing the applied voltage to an electron biprism, we have developed a 'twin-electron biprism' (TBP), which is composed of two filament electrodes and a pair of ground plates. The observed interference-fringe spacing revealed that the deflection angle created by a TBP was about twice larger than that by a 'conventional electron biprism'. Also, we have suggested, in a double-electron biprism interferometry, the optimal disposition of a TBP for reducing the intensity of Fresnel fringes recorded in an electron hologram.

引用

页码：353 / 358

页数：6

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