共 50 条
- [46] Optimization of alternating PSM mask process for 65nm poly gate patterning using 193nm lithography OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 1125 - 1136
- [47] Impact of optical absorption on process control for sub-0.15-μm device patterning using 193-nm lithography METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 781 - 790
- [49] Colloidal particle assembly using micro-patterning onto morphology-controlled anti-fouling polyelectrolyte multilayer films Macromolecular Research, 2016, 24 : 95 - 98