共 50 条
- [31] Process induced defects in sub-0.15-μm device patterning using 193 nm lithography METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 277 - 283
- [35] Direct integration of subwavelength structure on a GaAs solar cell by using colloidal lithography and dry etching process JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (03):
- [37] Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process 2014 51ST ACM/EDAC/IEEE DESIGN AUTOMATION CONFERENCE (DAC), 2014,
- [39] CD Uniformity improvement for Double-Patterning Lithography (Litho-Litho-Etch) Using Freezing Process ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI, 2009, 7273
- [40] Colloidal Film Formation Process Using Electrophoresis of Charged Particles in Liquid and Electrode Reaction Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy, 2023, 70 (10): : 407 - 415