Lattice-matched GaN-InAlN waveguides at λ=1.55 μm grown by metal-organic vapor phase epitaxy

被引:27
|
作者
Lupu, A. [1 ]
Julien, F. H. [1 ]
Golka, S. [2 ]
Pozzovivo, G. [2 ]
Strasser, G. [2 ]
Baumann, E. [3 ]
Giorgetta, F. [3 ]
Hofstetter, D. [3 ]
Nicolay, S. [4 ]
Mosca, M. [4 ]
Feltin, E. [4 ]
Carlin, J. -F. [4 ]
Grandjean, N. [4 ]
机构
[1] Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR 8622, F-91405 Orsay, France
[2] Vienna Univ Technol, Zentrum Mikround Nanostrukturen, A-1040 Vienna, Austria
[3] Univ Neuchatel, CH-2000 Neuchatel, Switzerland
[4] Ecole Polytech Fed Lausanne, Inst Quantum Elect & Photon, CH-1015 Lausanne, Switzerland
关键词
GaN; intersubband (ISB) devices; optical communication; optical waveguide (WG);
D O I
10.1109/LPT.2007.912551
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the demonstration of low-loss, single-mode GaN-InAlN ridge waveguides (WGs) at fiber-optics telecommunication wavelengths. The structure grown by metal-organic vapor phase epitaxy contains AlInN cladding layers lattice-matched to GaN. For slab-like WGs propagation losses are below 3 dB/mm and independent of light polarization. For 2.6-mu m-wide WGs the propagation losses in the 1.5-to 1.58-mu m spectral region are as low as 1.8 and 4.9 dB/mm for transverse-electric- and transverse-magnetic-polarization, respectively. The losses are attributed to the sidewall roughness and can be further reduced by the optimization of the etching process.
引用
收藏
页码:102 / 104
页数:3
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