The effect of growth stoichiometry on the GaN dislocation core structure

被引:0
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作者
Baines, MQ [1 ]
Cherns, D [1 ]
Hsu, JWP [1 ]
Manfra, MJ [1 ]
机构
[1] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
摘要
Plan-view transmission electron microscopy was used to study the core structures of different dislocations in (0001) GaN layers grown under Ga-rich and Ga-lean conditions by molecular beam epitaxy. In Ga-rich samples at least one third of mixed type dislocations were open-core, and edge dislocations were observed to be closed-core. In contrast, under Ga-lean conditions, all dislocations were observed to be closed-core, and many were associated with pits at the sample surface. High resolution Studies of the open core dislocations revealed that many were decorated with a disordered deposit, the origin of which is discussed.
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页码:41 / 46
页数:6
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