Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition

被引：6

作者：

Chiou, Ai-Huei ^{[2
]}

Chang, Yu-Ming ^{[3
]}

Wu, Wen-Fa ^{[4
]}

Chou, Chang-Ping ^{[2
]}

Hsu, Chun-Yao ^{[1
]}

机构：

[1] Lunghwa Univ Sci & Technol, Dept Mech Engn, Kueishan, Taiwan

[2] Natl Chiao Tung Univ, Dept Mech Engn, Hsinchu, Taiwan

[3] Atom Energy Council, Inst Nucl Energy Res, Tao Yuan, Taiwan

[4] Natl Nano Device Labs, Hsinchu, Taiwan

来源：

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2012年 / 23卷 / 04期

关键词：

SURFACE MODIFICATION; FUNCTIONALIZATION; PRETREATMENT; TEMPERATURE; COATINGS; GROWTH; FILMS;

D O I：

10.1007/s10854-011-0514-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic.

引用

页码：889 / 896

页数：8

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