Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition

被引：6

作者：

Chiou, Ai-Huei ^{[2
]}

Chang, Yu-Ming ^{[3
]}

Wu, Wen-Fa ^{[4
]}

Chou, Chang-Ping ^{[2
]}

Hsu, Chun-Yao ^{[1
]}

机构：

[1] Lunghwa Univ Sci & Technol, Dept Mech Engn, Kueishan, Taiwan

[2] Natl Chiao Tung Univ, Dept Mech Engn, Hsinchu, Taiwan

[3] Atom Energy Council, Inst Nucl Energy Res, Tao Yuan, Taiwan

[4] Natl Nano Device Labs, Hsinchu, Taiwan

来源：

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2012年 / 23卷 / 04期

关键词：

SURFACE MODIFICATION; FUNCTIONALIZATION; PRETREATMENT; TEMPERATURE; COATINGS; GROWTH; FILMS;

D O I：

10.1007/s10854-011-0514-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic.

引用

页码：889 / 896

页数：8

共 50 条

[11] The effect of NH3 plasma pre-treatment on the properties of TiN coatings produced by plasma-enhanced chemical vapor deposition (PECVD)
Kim, BJ
Kim, YC
Lee, DK
Lee, JJ
SURFACE & COATINGS TECHNOLOGY, 1999, 111 (01): : 56 - 61
[12] SURFACE BONDING OF THE NH3 AND NH2 SPECIES TO NI(110)
ALVEY, MD
KLAUBER, C
YATES, JT
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 1631 - 1632
[13] Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
Cho, Young Joon
Cha, Hamchorom
Chang, Hyo Sik
SURFACE & COATINGS TECHNOLOGY, 2016, 307 : 1096 - 1099
[14] Remote plasma-enhanced atomic-layer deposition of TiN by using TDMAT with a NH3 plasma
Kim, JY
Kim, DY
Park, HO
Jeon, H
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2004, 45 (06) : 1639 - 1643
[15] ELECTRONIC STRUCTURES OF NH, NH2, AND NH3
HIGUCHI, J
JOURNAL OF CHEMICAL PHYSICS, 1956, 24 (03): : 535 - 545
[16] Preparation of carbon nanotubes and nanoparticles by microwave plasma-enhanced chemical vapor deposition
Wang, XZ
Hu, Z
Chen, X
Chen, Y
SCRIPTA MATERIALIA, 2001, 44 (8-9) : 1567 - 1570
[17] Synthesis of carbon nanotubes on metal substrates by plasma-enhanced chemical vapor deposition
Kim, HS
Park, SY
Yang, JH
Park, CY
ON THE CONVERGENCE OF BIO-INFORMATION-, ENVIRONMENTAL-, ENERGY-, SPACE- AND NANO-TECHNOLOGIES, PTS 1 AND 2, 2005, 277-279 : 950 - 955
[18] Plasma-enhanced chemical vapor deposition carbon nanotubes for ethanol gas sensors
Hu, Chia-Te
Liu, Chun-Kuo
Huang, Meng-Wen
Syue, Sen-Hong
Wu, Jyh-Ming
Chang, Yee-shyi
Yeh, Jien-W.
Shih, Han-C.
DIAMOND AND RELATED MATERIALS, 2009, 18 (2-3) : 472 - 477
[19] Synthesis of carbon nanotubes on metal substrates by plasma-enhanced chemical vapor deposition
Kim, H.S., 2005, Trans Tech Publications Ltd (277-279)
[20] EQUIVALENT ORBITALS OF NH, NH2 AND NH3
TRINAJSTIC, N
CROATICA CHEMICA ACTA, 1966, 38 (04) : 287 - +

← 1 2 3 4 5 →