Micro-ball wafer bumping for flip chip interconnection

被引:8
|
作者
Hashino, E [1 ]
Shimokawa, K [1 ]
Yamamoto, Y [1 ]
Tatsumi, K [1 ]
机构
[1] Nippon Steel Corp Ltd, Adv Technol Res Labs, Futtsu, Chiba 2938511, Japan
关键词
D O I
10.1109/ECTC.2001.927922
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new wafer bumping method using micro-balls was developed that can be used for high-density LSI assembly, specifically for Flip Chip interconnection. Micro solder balls with the diameter ranging from 60 mum to 200 mum were first formed with a high level of accuracy and sphericity. These balls were transferred and bonded to the whole electrode-pads of an 8-inch wafer in one stroke using a fully automated micro ball mounter, which was newly developed. The balls were held on fluxed pads and melted in a reflow furnace. The fluxing was performed using unique stamp system. The productivity and the yield were evaluated under the following conditions. The number of chips on an 8 inch wafer was 616, Pad pitch was 250 mum, Pad number of a chip was 635 (25x25 area array), and the total number of balls on a wafer was 385,000. The yield of forming bumps was confirmed to be higher than 99.995% without repairing and the cycle time of micro ball bumping was ca. 5 min. for an 8 inch wafer. The bump height variation, the bump shear strength and the bond reliability were evaluated in comparison with other methods.
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页码:957 / 964
页数:8
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