Time-resolved measurement of film growth during high-power pulsed magnetron sputtering (HPPMS) of titanium: the rotating shutter concept

被引：8

作者：

Mitschker, F. ^{[1
]}

Prenzel, M. ^{[1
]}

Benedikt, J. ^{[1
]}

von Keudell, A. ^{[1
]}

机构：

[1] Ruhr Univ Bochum, Inst Expt Phys 2, Res Dept Plasmas Complex Interact, D-44780 Bochum, Germany

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2012年 / 45卷 / 40期

关键词：

D O I：

10.1088/0022-3727/45/40/402001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The growth rate during high-power pulsed magnetron sputtering (HPPMS) of titanium is measured with a temporal resolution of up to 54 mu s using a rotating shutter concept. According to that concept a 200 mu m slit is rotated in front of the substrate synchronous with the HPPMS pulses. Thereby, the growth flux is laterally distributed over the substrate. By measuring the resulting deposition profile with profilometry, the temporal variation of the growth flux per pulse is deduced. The analysis reveals that film growth occurs mainly during a HPPMS pulse, with the growth rate slowly increasing during the pulse and decaying afterwards with a decay time of 100 mu s. The maximum of film deposition shifts to earlier times in the pulse with increasing peak power.

引用

页数：4

共 47 条

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