共 50 条
- [43] INOR 530-Tungsten imido and hydrazido complexes as precursors for CVD of WNx and WNxCy thin films ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2007, 234
- [46] Copper oxide nanoparticles as a source for copper films. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 226 : U726 - U726
- [47] Boron carbonitride thin films by PACVD of single-source precursors Advanced Materials, 1997, 9 (12): : 257 - 262
- [49] Group III metal sulfide thin films from single-source precursors by chemical vapor deposition (CVD) techniques CHEMICAL PROCESSING OF DIELECTRICS, INSULATORS AND ELECTRONIC CERAMICS, 2000, 606 : 127 - 132
- [50] Group III metal sulfide thin films from single-source precursors by chemical vapor deposition (CVD) techniques Materials Research Society Symposium - Proceedings, 2000, 606 : 127 - 132