Degradation of Nitride Coatings in Low-Pressure Gas Discharge Plasma

被引：0

作者：

Ivanov, Yurii ^{[1
,2
]}

Shugurov, Vladimir ^{[1
]}

Krysina, Olga ^{[1
]}

Petrikova, Elizaveta ^{[1
]}

Tolkachev, Oleg ^{[2
]}

机构：

[1] Inst High Current Elect SB RAS, Tomsk 634055, Russia

[2] Tomsk Polytech Univ, Tomsk 634050, Russia

来源：

PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS WITH HIERARCHICAL STRUCTURE FOR NEW TECHNOLOGIES AND RELIABLE STRUCTURES 2017 (AMHS'17) | 2017年 / 1909卷

基金：

俄罗斯科学基金会;

关键词：

D O I：

10.1063/1.5013755

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The paper provides research data on the defect structure, mechanical characteristics, and tribological properties of commercially pure VT1-0 titanium exposed to surface modification on a COMPLEX laboratory electron-ion plasma setup which allows nitriding, coating deposition, and etching in low-pressure gas discharge plasma in a single vacuum cycle. It is shown that preliminary plasma nitriding forms a columnar Ti2N phase in VT1-0 titanium and that subsequent TiN deposition results in a thin nanocrystalline TiN layer. When the coating-substrate system is etched, the coating fails and the tribological properties of the material degrade greatly.

引用

页数：4

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