Degradation of Nitride Coatings in Low-Pressure Gas Discharge Plasma

被引:0
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作者
Ivanov, Yurii [1 ,2 ]
Shugurov, Vladimir [1 ]
Krysina, Olga [1 ]
Petrikova, Elizaveta [1 ]
Tolkachev, Oleg [2 ]
机构
[1] Inst High Current Elect SB RAS, Tomsk 634055, Russia
[2] Tomsk Polytech Univ, Tomsk 634050, Russia
基金
俄罗斯科学基金会;
关键词
D O I
10.1063/1.5013755
中图分类号
O59 [应用物理学];
学科分类号
摘要
The paper provides research data on the defect structure, mechanical characteristics, and tribological properties of commercially pure VT1-0 titanium exposed to surface modification on a COMPLEX laboratory electron-ion plasma setup which allows nitriding, coating deposition, and etching in low-pressure gas discharge plasma in a single vacuum cycle. It is shown that preliminary plasma nitriding forms a columnar Ti2N phase in VT1-0 titanium and that subsequent TiN deposition results in a thin nanocrystalline TiN layer. When the coating-substrate system is etched, the coating fails and the tribological properties of the material degrade greatly.
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页数:4
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