Observation of RHEED rocking curves during Si/Si(111) film growth

被引:10
|
作者
Shigeta, Y
Fukaya, Y
Mitsui, H
Nakamura, K
机构
[1] Yokohama City Univ, Fac Sci, Kanazawa Ku, Yokohama, Kanagawa 236, Japan
[2] Yokohama City Univ, Grad Sch Integrated Sci, Kanazawa Ku, Yokohama, Kanagawa 236, Japan
关键词
diffusion and migration; molecular beam epitaxy; reflection high-energy electron diffraction; silicon; surface morphology;
D O I
10.1016/S0039-6028(97)01059-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In order to study the growth mechanism of Si/Si(111), we have measured the rocking curves of reflection high-energy electron diffraction (RHEED) during the growth by using a magnetic deflector to change the glancing angle. Diffraction patterns were recorded on a laser video disc, via a television camera, at each glancing angle. The results observed during growth with the sample held at 250 degrees C under a "one beam condition" were compared to a calculated curve, derived from the surface morphology at each growth stage which had been measured with scanning tunneling microscopy. The experimental data are not in good agreement with calculated curves. Better agreement is obtained when the presence of a two-dimensional atomic Si gas is taken into consideration. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:313 / 317
页数:5
相关论文
共 50 条
  • [21] Growth of AlGaN Film on Si (111) Substrate
    Zhang, Yang
    Chen, Bingzhen
    Peng, Na
    Zhang, Lu
    Yang, Cuiba I.
    Pan, Xu
    Yao, Shun
    Wang, Zhiyong
    INTERNATIONAL SEMINAR ON APPLIED PHYSICS, OPTOELECTRONICS AND PHOTONICS (APOP 2016), 2016, 61
  • [22] OBSERVATION OF SI(001) VICINAL SURFACES ON RHEED
    SAKAMOTO, K
    SAKAMOTO, T
    MIKI, K
    NAGAO, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (09) : 2705 - 2710
  • [23] RHEED intensity oscillations observed during the growth of YSi2-x on Si(111) substrates
    Daniluk, A
    Mazurek, P
    Paprocki, K
    Mikolajczak, P
    SURFACE SCIENCE, 1997, 391 (1-3) : 226 - 236
  • [24] RHEED studies of MnF2 epitaxial growth on Si(111) substrates
    Yakovlev, NL
    Banshchikov, AG
    Moisseeva, MM
    Sokolov, NS
    Beeby, JL
    Maksym, PA
    SURFACE AND INTERFACE ANALYSIS, 1999, 28 (01) : 264 - 266
  • [25] Distributed growth model used for the interpretation of RHEED intensity oscillations observed during the growth of Pb on Si(111) substrates
    Daniluk, A
    Mazurek, P
    Paprocki, K
    Mikolajczak, P
    THIN SOLID FILMS, 1997, 306 (02) : 228 - 230
  • [26] Hydrogen terminated Si(111) surface studied by RHEED
    Yakovlev, NL
    Shusterman, YV
    Maksym, PA
    APPLIED SURFACE SCIENCE, 1998, 130 : 310 - 313
  • [27] Catalystlike behavior of Si adatoms in the growth of monolayer Al film on Si(111)
    Teng, Jing
    Zhang, Lixin
    Jiang, Ying
    Guo, Jiandong
    Guo, Qinlin
    Wang, Enge
    Ebert, Philipp
    Sakurai, T.
    Wu, Kehui
    JOURNAL OF CHEMICAL PHYSICS, 2010, 133 (01):
  • [28] RHEED INTENSITY ANALYSIS OF LI/SI(111) STRUCTURES
    KOHMOTO, S
    MIZUNO, S
    ICHIMIYA, A
    APPLIED SURFACE SCIENCE, 1989, 41-2 : 107 - 111
  • [29] RHEED STUDY ON THE GE/SI(111) AND SI/GE(111) SYSTEMS - REACTION OF GE WITH THE SI(111)(7X7) SURFACE
    ICHIKAWA, T
    INO, S
    SURFACE SCIENCE, 1984, 136 (2-3) : 267 - 284
  • [30] AN EFFICIENT MULTIPLE PARAMETER EVALUATION OF MEASURED RHEED ROCKING CURVES APPLIED TO PT(111)
    STOCK, M
    MEYEREHMSEN, G
    SURFACE SCIENCE, 1990, 226 (1-2) : L59 - L62