Microstresses in molybdenum nitride thin films deposited by reactive DC magnetron sputtering

被引：4
|
作者：
Shen, YG [1 ]
机构：
[1] City Univ Hong Kong, Dept MEEM, Kowloon, Hong Kong, Peoples R China
来源：
RESIDUAL STRESSES VII, PROCEEDINGS | 2005年 / 490-491卷
关键词：
microstress; molybdenum nitride; reactive magnetron sputtering; thin films;
D O I：
10.4028/www.scientific.net/MSF.490-491.589
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：589 / 594
页数：6
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