Microstresses in molybdenum nitride thin films deposited by reactive DC magnetron sputtering

被引：4
|
作者：
Shen, YG [1 ]
机构：
[1] City Univ Hong Kong, Dept MEEM, Kowloon, Hong Kong, Peoples R China
来源：
RESIDUAL STRESSES VII, PROCEEDINGS | 2005年 / 490-491卷
关键词：
microstress; molybdenum nitride; reactive magnetron sputtering; thin films;
D O I：
10.4028/www.scientific.net/MSF.490-491.589
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：589 / 594
页数：6
相关论文
共 50 条
  • [1] Aluminium nitride thin films deposited by DC reactive magnetron sputtering
    Dimitrova, V
    Manova, D
    Paskova, T
    Uzunov, T
    Ivanov, N
    Dechev, D
    [J]. VACUUM, 1998, 51 (02) : 161 - 164
  • [2] Silicon Nitride Thin Films Deposited by DC Pulse Reactive Magnetron Sputtering
    Zhang, Xiao-Feng
    Wen, Pei-Gang
    Yan, Yue
    [J]. SEVENTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2011, 7995
  • [3] Copper nitride films deposited by dc reactive magnetron sputtering
    K. Venkata Subba Reddy
    A. Sivasankar Reddy
    P. Sreedhara Reddy
    S. Uthanna
    [J]. Journal of Materials Science: Materials in Electronics, 2007, 18 : 1003 - 1008
  • [4] Copper nitride films deposited by dc reactive magnetron sputtering
    Reddy, K. Venkata Subba
    Reddy, A. Sivasankar
    Reddy, P. Sreedhara
    Uthanna, S.
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (10) : 1003 - 1008
  • [5] AlNxOy thin films deposited by DC reactive magnetron sputtering
    Borges, J.
    Vaz, F.
    Marques, L.
    [J]. APPLIED SURFACE SCIENCE, 2010, 257 (05) : 1478 - 1483
  • [6] Deposition of molybdenum nitride thin films by rf reactive magnetron sputtering
    Anitha, VP
    Major, S
    Chandrashekharam, D
    Bhatnagar, M
    [J]. SURFACE & COATINGS TECHNOLOGY, 1996, 79 (1-3): : 50 - 54
  • [7] TITANIUM NITRIDE THIN-FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    GEORGIEV, GP
    POPOV, DN
    [J]. PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 587 - 594
  • [8] Characterization of ALN thin films deposited by DC reactive magnetron sputtering
    Garcia-Mendez, M.
    Morales-Rodriguez, S.
    Machorro, R.
    De La Cruz, W.
    [J]. REVISTA MEXICANA DE FISICA, 2008, 54 (04) : 271 - 278
  • [9] Characterization of ZrN Thin Films Deposited by Reactive DC Magnetron Sputtering
    Choeysuppaket, Attapol
    Witit-anun, Nirun
    Chaiyakun, Surasing
    [J]. APPLIED PHYSICS AND MATERIAL APPLICATIONS, 2013, 770 : 350 - 353
  • [10] Characterization of carbon nitride thin films deposited by reactive dc magnetron sputtering on various substrate materials
    Zheng, WT
    Hellgren, N
    Sjostrom, H
    Sundgren, JE
    [J]. SURFACE & COATINGS TECHNOLOGY, 1998, 100 (1-3): : 287 - 290
12345