Ion density and temperature distributions in an inductively coupled high-plasma density reactor

被引：3

作者：

Lymberopoulos, DP ^{[1
]}

Wise, RS ^{[1
]}

Economou, DJ ^{[1
]}

Bartel, TJ ^{[1
]}

机构：

[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1996年 / 24卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1109/27.491746

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

In a low-pressure plasma, the ion temperature T-i is comparable to the gas temperature T-g in regions of weak electric fields, but T-i can be more than an order of magnitude higher than T-g near the plasma sheath.

引用

页码：129 / 130

页数：2

共 50 条

[1] Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor
Sobolewski, MA
Olthoff, JK
Wang, YC
[J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (08) : 3966 - 3975
[2] Ion density distribution in an inductively coupled plasma chamber
Chen, JF
Zhao, WF
Wu, XQ
Fan, SL
Fu, SL
[J]. PLASMA SCIENCE & TECHNOLOGY, 2004, 6 (02): : 2233 - 2236
[3] Ion Density Distribution in an Inductively Coupled Plasma Chamber
陈俊芳
赵文锋
吴先球
樊双莉
符斯列
[J]. Plasma Science and Technology, 2004, (02) : 2233 - 2236
[4] APPLICATION OF A HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA REACTOR TO POLYSILICON ETCHING
PATRICK, R
SCHOENBORN, P
TODA, H
BOSE, F
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1296 - 1300
[5] SPATIAL DISTRIBUTIONS OF METASTABLE ARGON, TEMPERATURE AND ELECTRON NUMBER DENSITY IN AN INDUCTIVELY COUPLED ARGON PLASMA
UCHIDA, H
TANABE, K
NOJIRI, Y
HARAGUCHI, H
FUWA, K
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1981, 36 (07) : 711 - 718
[6] Chemical modeling of a high-density inductively-coupled plasma reactor containing silane
Kovalgin, A. Y.
Boogaard, A.
Brunets, I.
Holleman, J.
Schmitz, J.
[J]. SURFACE & COATINGS TECHNOLOGY, 2007, 201 (22-23): : 8849 - 8853
[7] Fluorocarbon polymer deposition kinetics in a low-pressure, high density, inductively coupled plasma reactor
Sowa, MJ
Littau, ME
Pohray, V
Cecchi, JL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (05): : 2122 - 2129
[8] TEMPERATURE AND VELOCITY DISTRIBUTIONS IN AN INDUCTIVELY COUPLED PLASMA
BARNES, RM
SCHLEICHER, RG
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1981, 36 (02) : 81 - 101
[9] Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher
Lin, Chaung
Leou, Keh-Chyang
Huang, Hong-Min
Hsieh, Cheng-Hung
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (01): : 157 - 164
[10] PLASMA UNIFORMITY IN HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA TOOLS
STEWART, RA
VITELLO, P
GRAVES, DB
JAEGER, EF
BERRY, LA
[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (01): : 36 - 46

← 1 2 3 4 5 →