共 50 条
- [1] Ion density distribution in an inductively coupled plasma chamber [J]. PLASMA SCIENCE & TECHNOLOGY, 2004, 6 (02): : 2233 - 2236
- [2] Violation of the boltzmann distribution for plasma electron number density in two-chamber inductively coupled plasma discharges [J]. Technical Physics, 2015, 60 : 1570 - 1573
- [4] Electrical Characteristics and Plasma Distribution Depending on Chamber Length in a Top Inductively Coupled Plasma [J]. Transactions of the Korean Institute of Electrical Engineers, 2022, 71 (08): : 1135 - 1141
- [7] Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (01): : 157 - 164
- [8] Ion flux, ion energy distribution and neutral density in an inductively coupled argon discharge [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04): : 568 - 573
- [9] Control of plasma density distribution via wireless power transfer in an inductively coupled plasma [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2013, 22 (03):