Ion Density Distribution in an Inductively Coupled Plasma Chamber

被引:0
|
作者
陈俊芳
赵文锋
吴先球
樊双莉
符斯列
机构
[1] China
[2] Guangzhou 510631
[3] School of Physics and Telecommunications Engineering
[4] South China Normal University
关键词
inductively coupled plasma; ion density distribution; angmuir probe;
D O I
暂无
中图分类号
O532 [约束与加热];
学科分类号
070204 ;
摘要
The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z =0 achieves 5.8×1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber.
引用
收藏
页码:2233 / 2236
页数:4
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