Ion density and temperature distributions in an inductively coupled high-plasma density reactor

被引：3

作者：

Lymberopoulos, DP ^{[1
]}

Wise, RS ^{[1
]}

Economou, DJ ^{[1
]}

Bartel, TJ ^{[1
]}

机构：

[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1996年 / 24卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1109/27.491746

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

In a low-pressure plasma, the ion temperature T-i is comparable to the gas temperature T-g in regions of weak electric fields, but T-i can be more than an order of magnitude higher than T-g near the plasma sheath.

引用

页码：129 / 130

页数：2

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