Influence of the Ratio of Gate Length to Source-Drain Distance on the Sensitivity of the AlGaN/GaN HEMT Based Chemical Sensors and Biosensors

被引:0
|
作者
Xue, Dongyang [1 ]
Zhang, Heqiu [1 ]
Liang, Hongwei [1 ]
Liu, Jun [1 ]
Xia, Xiaochuan [1 ]
机构
[1] Dalian Univ Technol, Sch Microelect, Dalian, Peoples R China
基金
中国国家自然科学基金;
关键词
AlGaN/GaN; chemical sensors and biosensors; transconductance; ratio of gate length to source-drain distance;
D O I
10.1117/12.2559622
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the mechanism of the open-gate AlGaN/GaN HEMT based sensors were discussed and the effect of the ratio of gate length (L-G) to source-drain distance (L-SD) on the transconductance (g(m)) of the sensors was investigated. It was shown that the smaller L-G/L-SD of the devices would get a higher maximum g(m) (g(m-max)). However, when the gate voltage (V-G) increased to a certain extent, the g(m) of the larger L-G/L-SD devices would be higher. The experimental results were demonstrated by further theoretical calculation and analysis which is beneficial to enhance the sensitivity of the AlGaN/GaN HEMT based chemical sensors and biosensors by improving the g(m) of them.
引用
收藏
页数:5
相关论文
共 37 条
  • [31] Thermal influence on S22 kink behavior of a 0.15 μm gate length AlGaN/GaN/SiC HEMT for microwave applications
    Alim, Mohammad A.
    Rezazadeh, Ali A.
    Gaquiere, Christophe
    Crupi, Giovanni
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2019, 34 (03)
  • [32] Low damage, Cl2-based gate recess etching for 0.3-μm gate-length AlGaN/GaN HEMT fabrication
    Wang, WK
    Li, YJ
    Lin, CK
    Chan, YJ
    Chen, GT
    Chyi, JI
    IEEE ELECTRON DEVICE LETTERS, 2004, 25 (02) : 52 - 54
  • [33] An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-μm Gate-Length HEMT Based on the GaN Technology
    Alim, Mohammad Abdul
    Gaquiere, Christophe
    Crupi, Giovanni
    MICROMACHINES, 2021, 12 (05)
  • [34] Millimeter-Wave Single-Pole Double-Throw Switches Based on a 100-nm Gate-Length AlGaN/GaN-HEMT Technology
    Thome, Fabian
    Brueckner, Peter
    Quay, Ruediger
    Ambacher, Oliver
    2019 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM (IMS), 2019, : 1403 - 1406
  • [35] Threshold and surface potential-based sensitivity analysis of symmetrical double gate AlGaN/GaN MOS-HEMT including capacitance effects for label-free biosensing
    Sriramani, P.
    Mohankumar, N.
    Prasamsha, Y.
    Sarkar, Angsuman
    Chanda, Manash
    PHYSICA SCRIPTA, 2023, 98 (11)
  • [36] High-performance AlGaN/GaN MIS-HEMT device based on in situ plasma nitriding and low power chemical vapor deposition Si3N4 gate dielectrics
    Li Shu-Ping
    Zhang Zhi-Li
    Fu Kai
    Yu Guo-Hao
    Cai Yong
    Zhang Bao-Shun
    ACTA PHYSICA SINICA, 2017, 66 (19)
  • [37] Improvement of transconductance and cut-off frequency in In0.1Ga0.9N back-barrier-based double-channel Al0.3Ga0.7N/GaN high electron mobility transistor by enhancing the drain source contact length ratio
    Mohapatra, Rachita
    Dutta, Pradipta
    PRAMANA-JOURNAL OF PHYSICS, 2019, 94 (01):