On the nano-hillock formation induced by slow highly charged ions on insulator surfaces

被引：44

作者：

Lemell, C. ^{[1
]}

El-Said, A. S.

Meissl, W.

Gebeshuber, I. C.

Trautmann, C.

Toulemonde, M.

Burgdoerfer, J.

Aumayr, F.

机构：

[1] Vienna Univ Technol, Inst Theoret Phys, A-1040 Vienna, Austria

[2] Mansoura Univ, Fac Sci, Dept Phys, Mansoura 35516, Egypt

[3] Vienna Univ Technol, Inst Allgemeine Phys, A-1040 Vienna, Austria

[4] GSI Darmstadt, D-64291 Darmstadt, Germany

[5] CNRS, Ctr Interdisciplinaire Rech Ions Laser, Lab Commun CEA, UCBN ENSICAEN, F-14070 Caen, France

来源：

SOLID-STATE ELECTRONICS | 2007年 / 51卷 / 10期

关键词：

hillock formation; ion-insulator interactions; nanostructuring;

D O I：

10.1016/j.sse.2007.06.016

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We discuss the creation of nano-sized protrusions on insulating surfaces using slow highly charged ions. This method holds the promise of forming regular structures on surfaces without inducing defects in deeper lying crystal layers. We find that only projectiles with a potential energy above a critical value are able to create hillocks. Below this threshold no surface modification is observed. This is similar to the track and hillock formation induced by swift (similar to GeV) heavy ions. We present a model for the conversion of potential energy stored in the projectiles into target-lattice excitations (heat) and discuss the possibility to create ordered structures using the guiding effect observed in insulating conical structures. (C) 2007 Elsevier Ltd. All rights reserved.

引用

页码：1398 / 1404

页数：7

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