A deep level transient spectroscopy study on the interface states across grain boundaries in multicrystalline silicon

被引:1
|
作者
Chen, J. [1 ]
Cornagliotti, E. [2 ]
Simoen, E. [2 ]
Hieckmann, E. [1 ]
Weber, J. [1 ]
Poortmans, J. [2 ]
机构
[1] Tech Univ Dresden, Inst Appl Phys, D-01062 Dresden, Germany
[2] IMEC, B-3001 Louvain, Belgium
来源
关键词
multicrystalline silicon; grain boundaries; DLTS; recombination activity; interface states; BEAM-INDUCED CURRENT; ELECTRICAL-ACTIVITY; CONTAMINATION; CHARACTER; POLYCRYSTALLINE; DEFECTS; TRAPS;
D O I
10.1002/pssr.201105225
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Degrading the recombination activities of grain boundaries (GBs) is essential to improve the efficiency of multicrystalline silicon (mc-Si) based solar cells. We apply the deep level transient spectroscopy technique to detect interface states at Sigma 3 and Sigma 9 GBs in me-Si. The density of interface states close to midgap is found comparable for both as-grown GBs. Gettering or hydrogenation leads to shallower states with a smaller capture cross section and lower density. Recombination activity reduction for Sigma 3 GBs is stronger than for Sigma 9 GBs especially after hydrogenation. Both the analysis approach and experimental results could be applied for a specific GB engineering of mc-Si based solar cells. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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页码:277 / 279
页数:3
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