Pattern shape comparison methods using SEM image

被引：2
|
作者：
Ikeda, T [1 ]
Kotani, T [1 ]
Sato, T [1 ]
Ueno, K [1 ]
Matsuoka, R [1 ]
机构：
[1] Toshiba Co Ltd, Yokohama, Kanagawa 2358522, Japan
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2 | 2003年 / 5038卷
关键词：
CD-SEM; GDS II; Fourier descriptor;
D O I：
10.1117/12.482831
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We have developed a new system, "PF-3000", which realizes the pattern shape comparison between CAD layout data and CD-SEM images([1]). Comparison results are expressed as the difference of edge location and area in this system. Moreover, we investigated different methods of shape comparison. Fourier descriptor (FD)([2]) is one of the most useful method.
引用
收藏
页码：950 / 961
页数：12
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