Pattern shape comparison methods using SEM image

被引：2

作者：

Ikeda, T ^{[1
]}

Kotani, T ^{[1
]}

Sato, T ^{[1
]}

Ueno, K ^{[1
]}

Matsuoka, R ^{[1
]}

机构：

[1] Toshiba Co Ltd, Yokohama, Kanagawa 2358522, Japan

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2 | 2003年 / 5038卷

关键词：

CD-SEM; GDS II; Fourier descriptor;

D O I：

10.1117/12.482831

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a new system, "PF-3000", which realizes the pattern shape comparison between CAD layout data and CD-SEM images([1]). Comparison results are expressed as the difference of edge location and area in this system. Moreover, we investigated different methods of shape comparison. Fourier descriptor (FD)([2]) is one of the most useful method.

引用

页码：950 / 961

页数：12

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