Blob Defect Prevention in 193nm Topcoat-free Immersion Lithography

被引：0
|
作者：
Wang, Deyan [1 ]
Liu, Jinrong [1 ]
Kang, Doris [1 ]
Liu, Cong [1 ]
Estelle, Tom [1 ]
Xu, Cheng-Bai [1 ]
Barclay, George [1 ]
Trefonas, Peter [1 ]
机构：
[1] Dow Chem Co USA, Dow Elect Mat, Marlborough, MA 01752 USA
来源：
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX | 2012年 / 8325卷
关键词：
D O I：
10.1117/12.916818
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页数：8
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