Optical and structural characterization of InGaN quantum-well heterostructures grown by metalorganic chemical vapor deposition

被引:0
|
作者
Dupuis, RD [1 ]
Grudowski, PA [1 ]
Eiting, CJ [1 ]
Shmagin, IC [1 ]
Kolbas, RM [1 ]
Rosner, SJ [1 ]
机构
[1] Univ Texas, Microelect Res Ctr, Austin, TX 78712 USA
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe the optical and structural properties of InGaN multiple-quantum-well (MQW) heterostructures grown by metalorganic chemical vapor deposition on (0001) sapphire substrates. These structures consist of InxGa1-xN quantum wells and InxGa1-yN barrier layers with GaN or AlGaN cladding layers. A comparison of the 300K photoluminescence spectra of these samples indicates that the emission from the quantum well structure is not strongly affected by the high-temperature overlayer growth of GaN or AlGaN films. X-ray diffraction scans show superlattice peaks and indicate that the MQW's are fully strained.
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页码:231 / 234
页数:4
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