Thermo-optical properties of porous silica thin films produced by sol-gel method

被引：6
|
作者：
Jaglarz, Janusz [1 ]
Dulian, Piotr [2 ]
Karasinski, Pawel [3 ]
机构：
[1] Cracow Univ Technol, Fac Mat Engn & Phys, 37 JPII St, PL-31155 Krakow, Poland
[2] Cracow Univ Technol, Fac Chem Engn & Technol, 24 Warszawska St, PL-31155 Krakow, Poland
[3] Silesian Tech Univ, Dept Optoelect, 2 B Krzywoustego St, PL-44100 Gliwice, Poland
来源：
MATERIALS CHEMISTRY AND PHYSICS | 2020年 / 243卷 / 243期
关键词：
Sol-gel process; Thin films; Spectroscopic ellipsometry; Porous silica film; Antireflection coatings; ANTIREFLECTIVE FILMS; SURFACE-ROUGHNESS; COATINGS; TRANSMITTANCE; COEFFICIENTS; FABRICATION; TAILS; LAYER;
D O I：
10.1016/j.matchemphys.2019.122603
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this work, the spectral dispersion of optical constants of porous silica thin films have been presented. To determine the optical properties of porous SiO2 films, the ellipsometer Woolam M - 2000 working in the spectral range 190-1700 nm was applied. The thermo-optical coefficients of porous SiO2 films and thermal thickness dependence in temperature range 25-300 degrees C have been determined. The porous SiO2 layers exhibited low refractive indices. The thermo-optical coefficients of presented samples were negative due to the porous structure of SiO2 films. Moreover, it has been stated that thinness has been independent of temperature. After returning to starting conditions, the refractive indices were closer to starting values which confirmed partial reversibility of the heating and cooling process of porous. The thermal properties of porous silica films have been discussed.
引用
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页数：6
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