Effect of target-substrate working distance on magnetron sputter deposition of nanostructured titanium aluminium nitride coatings

被引：42
|
作者：
Wuhrer, R
Yeung, WY
机构：
[1] Univ Technol Sydney, Dept Chem Mat & Forens Sci, Sydney, NSW 2007, Australia
[2] Univ Technol Sydney, Microstruct Anal Unit, Sydney, NSW 2007, Australia
来源：
SCRIPTA MATERIALIA | 2003年 / 49卷 / 03期
关键词：
nanocrystalline materials; thin films; sputtering;
D O I：
10.1016/S1359-6462(03)00264-1
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Nanostructured titanium aluminium nitride coatings were produced via magnetron sputtering. The target-substrate working distance showed significant effects on the microstructure and property development of the coatings. With a smaller working distance, densified, nanostructured ternary nitride coatings with substantially higher hardness were produced. (C) 2003 Acta Materialia, Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：199 / 205
页数：7
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